The following film covers the beginning of the Plasma Quest remote high density plasma generation process, the key to the HiTUS sputtering (physical vapor deposition) technology behind PQL's much improved results not possible through traditional magnetron, ion beam, thermal evaporation and chemical vapour deposition coating systems. Additionally PQL’s thin film sputtering technology has delivered superior differentiated coating characteristics for the photonic, semiconductor, and photovoltaic sectors, as well as magnetic and dielectric applications.
Tuesday, October 03, 2006
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